CN
Product Technology
semicon
IC
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Advanced Packaging
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
MEMS
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
silicon-based microdisplay
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
semiconductor industry
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
other
Trancendor® Wafer Vacuum Transfer System
photovoltaic
boron diffusion
Hsihe® Series High Temperature Low Pressure Systems
annealing
Hsihe® Series High Temperature Low Pressure Systems
Tunneling oxidation/polysilicon deposition
Zhu Rong Series ZR5000×2 Tubular PECVD ToxPoly All-in-one System
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
Positive film Al₂O₃/SiNₓ
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
positive film Al₂O₃
Quaife® Series KF20000 Batch ALD System
backing film SiNₓ
Zhu Rong Series ZR5000×1 Tubular PECVD System
barrier package
electron transport layer SnOₓ
Interface layer/encapsulation layer AIOₓ
Industrialization Application Center
Industrialization Application Center
iOptomic Series Atomic Layer Deposition Systems
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Houyi® Series Plate ALD System
iSparol Series Roll-to-Roll ALD System
iTomic® MW Lite Bulk Light Series Atomic Layer Deposition System
Positive film Al₂O₃/SiNₓ
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong series ZR5000×2 tube PEALD/PECVD integrated system utilizes Micro-Nano's original design of industrial grade plasma enhanced atomic layer deposition (PEALD) technology, and the industry's innovative PEALD/PECVD new technology of the same tube, realizing ultra-high throughput batch PEALD coating, which is another breakthrough in ALD field of mass-production, and is specially tailored for the contact passivation technology (TOPCon, HPBC, POLO, SHJ, and TBC). It is another breakthrough in mass production technology in the field of ALD, tailored for contact passivation technology (TOPCon, HPBC, POLO, SHJ and TBC), providing reliable mass production solutions for post-PERC high-efficiency cell technology and leading the PV industrialization of high-efficiency cell manufacturing.
Sales Email
Product Features
For PERC, TOPCon, XBC and other high-efficiency cell technology routes
1
Superior temperature control and plasma control system, compatible with PECVD process, together with the graphite boat design with ultra-high wafer loading capacity, ensures the capacity of the equipment while significantly increasing the cell conversion efficiency
2
Accurate preparation of tunneled silicon oxide with film thickness less than 2 nm, compatible with various materials and processes, including SiO₂/poly-Si(n+), poly-Si(p+), Al₂O₃/SiNx, etc
3
Excellent film thickness uniformity
4
Provides TOPCon mass production process PEALD/ PECVD route integration technology with adjustable polysilicon in-situ doping concentration (1E20~1E21) required for passivation contact technology
5
For the new PE-TOPCon battery technology core tunneling oxide layer and polycrystalline silicon film developed a conductive coating, in situ doping and non-explosive film tube PEALD/PECVD ToxPoly tube integration technology, the research results have been widely reprinted and successfully completed the industrialization
6
Reception Hotline：
0510-81975900
Company Addresses：
江苏省无锡市新吴区长江南路27号
Site Map | Privacy | Legal Notices
© 2013 Jiangsu Microguide Nano Technology Co. All rights reserved.
苏ICP备16047353号-1