江苏微导纳米科技股份有限公司

Based on the company's existing technology, we build an R&D platform, a high-end R&D talent training platform and an incubator for future new projects and new enterprise development around the strategic demand for localized substitution, combined with the most cutting-edge technological development trends in the industry and market demand for advanced technology and process performance. The industrialization application center enables the company to have the ability of forward-looking application customization, and can provide customers with full-scene Demo equipment line, so as to be able to respond to all kinds of customer needs in a timely manner, and provide customers with a full range of solutions.

Process Development Capabilities

Professional Team

Fully staffed
Specializing in physics, chemistry, materials, semiconductors, microelectronics, etc.

Success Stories

Experienced in process development
More than 10 types of oxide, nitride and metal materials have been successfully developed.

mass production process

Familiar with ALD process and application scenarios
Can develop mass-production process for customer and market needs.

Forward-looking applications

Strong upstream and downstream knowledge of the industry
Mastery of leading international ALD technologies.

Industry-University-Research Cooperation

Demo Control

Experienced in customer demo, providing professional support for mass production solutions.

Professional Solutions

Solutions can be specialized and customized for customer needs.

Product Characteristics

Familiarize yourself with the characteristics of ALD-prepared films and gain an in-depth understanding of their functional applications.

Industry experience

Familiar with ALD process and application scenarios, covering semiconductor, photovoltaic, new materials, new energy and other fields.

Academic cooperation

We have established good cooperative relationship with Shanghai Jiao Tong University, Nanjing University and Helsinki University. The University of Helsinki, Finland and other well-known institutions to establish good relations of cooperation, and jointly promote the development of ALD technology innovation.

Product Showcase

iOptomic Series Atomic Layer Deposition Systems

iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems

Houyi® Series Plate ALD System

iSparol Series Roll-to-Roll ALD System

iTomic® MW Lite Bulk Light Series Atomic Layer Deposition System

Application Areas

Semiconductor industry
Wafer-like substrates

We are committed to the development of thin film materials for customer processes, such as high dielectric constant and metallization, as well as thin film materials for memory MIMs, etc. We are also expanding the development of low-temperature silicon oxide, silicon nitride, and other thin film materials to meet the needs of a wide range of customers.

Wafer package
Wafer-like substrates

Committed to the development of water-resistant functional films to enhance device reliability; involved in the field of OLED, Mini-LED, Mirco-LED and other optoelectronic display field.

Flexible package
Amorphous substrates

For flexible substrates, we are committed to the development of functional films such as water- and oxygen-blocking layers, anti-reflective layers, permeability-enhancing layers, transparent conductive layers, dielectric layers, etc.; the fields involved include water- and oxygen-blocking protective layers for flexible packages for displays, and cladding layers for new types of display devices.

Powder coating
Amorphous substrates

Committed to the development of ionic conductive interface layer, artificial SEI film protection film, lithium battery positive and negative electrode protection film, quantum dots / microsphere particles passivation film, micro-nano-catalyst particles, etc.; Involved in the field of liquid, semi-solid and all-solid electrolyte power lithium battery manufacturing field, optoelectronic devices in the field of quantum dots coating, all kinds of micro-nano-catalyst particles coating, and so on.

Chalcogenide photovoltaics
Amorphous substrates

We are committed to the development of functional film layers such as electron transport layer, hole transport layer, interface modification layer and water-oxygen barrier. The fields involved include crystalline silicon chalcogenide stacked cells, single junction chalcogenide cells, double junction chalcogenide cells, and fully flexible chalcogenide cells.

Optical attenuation
Amorphous substrates

We are committed to developing high and low refractive index transparent oxide film layers, new structure gradient refractive index oxide film layers, and realizing reflectivity <0.1% in 420~680 band. The fields involved include conventional optics and SWC optics.

TFT Functional Layer
Amorphous substrates

We are committed to the development of high carrier mobility metal oxide films, adjusting the carrier mobility adjustable for different needs of the device to improve the device performance. The fields involved include OLED, TFT and other optoelectronic display fields.

Collaborative R&D

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iacsale@leadmicro.com

Business after-sales consulting

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iacservice@leadmicro.com