Industrialization Application Center
iOptomic Series Atomic Layer Deposition Systems
iOptomic series atomic layer deposition system adopts micro-conducting nanometer design plasma source, reaction chamber design, combined with advanced ALD coating deposition technology, can be for wafers, glass, plastics and other shaped substrate surface deposition of conformal and uniform film, with professional film system design to achieve the optical performance of different products. The system is equipped with the functions of carrier table rotation, static/dynamic compatibility, plasma, etc. It is suitable for the industrialized mass production of various types of optical cameras, AR/VR optical lenses and precision optical components.
Sales Email
iacsale@leadmicro.com
