CN
Product Technology
Industrialization Application Center
iSparol Series Roll-to-Roll ALD System
Based on independent research and development, we have developed a large-scale roll-to-roll atomic layer deposition coating platform by combining ultra-large spatial ALD coating technology with vacuum roll-to-roll technology. The platform integrates ultra-large planar atomic layer deposition (ALD) system and develops mature process material system to meet the industrialization and mass production, realizing the overall solution of preparing high barrier film on ultra-wide flexible substrate. After years of industrialization verification and equipment upgrading has been iterated to the second generation of products. We have received customer acceptance and multiple repeat orders.
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Product Features
Suitable for various polymer materials, flexible thin film batteries, flexible devices and other flexible substrates, such as PET\PEN\PI\EVOH, etc
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Applicable substrate size: thickness compatible with 50 ~ 250um, width ≤ 1.5m, common size roll diameter 150mm, the whole roll outside diameter ≤ 800mm, can be customized
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Preparation of high-quality dense oxide films such as alumina (AlOx) and alumina stacked materials to achieve WVTR ≤ 10-3g/㎡.day
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Suitable for continuous roll-to-roll coating of large-area flexible substrates at a production rate of 2m/min
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