CN
Product Technology
semicon
IC
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Advanced Packaging
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
MEMS
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
silicon-based microdisplay
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
semiconductor industry
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
other
Trancendor® Wafer Vacuum Transfer System
photovoltaic
boron diffusion
Hsihe® Series High Temperature Low Pressure Systems
annealing
Hsihe® Series High Temperature Low Pressure Systems
Tunneling oxidation/polysilicon deposition
Zhu Rong Series ZR5000×2 Tubular PECVD ToxPoly All-in-one System
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
Positive film Al₂O₃/SiNₓ
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
positive film Al₂O₃
Quaife® Series KF20000 Batch ALD System
backing film SiNₓ
Zhu Rong Series ZR5000×1 Tubular PECVD System
barrier package
electron transport layer SnOₓ
Interface layer/encapsulation layer AIOₓ
Industrialization Application Center
Industrialization Application Center
iOptomic Series Atomic Layer Deposition Systems
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Houyi® Series Plate ALD System
iSparol Series Roll-to-Roll ALD System
iTomic® MW Lite Bulk Light Series Atomic Layer Deposition System
Industrialization Application Center
Houyi® Series Plate ALD System
Adopting proprietary intellectual property rights to design the temperature field and flow field in the vacuum cavity, realizing the spatial atomic layer deposition coating process, providing high-quality oxide functional layer thin film materials for the production line of chalcogenide thin-film solar cell modules, so as to ensure the high efficiency and long service life of mass-produced modules. For square meter glass substrate, high-speed coating solution, adapting to the production rhythm of linear production line, integrating mature loading and unloading automation solutions, providing customers with reliable mass production solutions.
Sales Email
Product Features
Calcium titanite thin film solar modules for formal or reverse, single junction or stacked layers
1
For square meter area glass substrate, common size 0.6×1.2 square meters/1.2×2.4 square meters can be customized.
2
Preparation of high-quality dense oxide films such as tin oxide (SnOx) and aluminum oxide (AlOx)
3
Excellent film thickness area uniformity, <5% within sheet, <5% between batches
4
60s/chip @ 20nm for large-area substrate linear lines
5
Reception Hotline：
0510-81975900
Company Addresses：
江苏省无锡市新吴区长江南路27号
Site Map | Privacy | Legal Notices
© 2013 Jiangsu Microguide Nano Technology Co. All rights reserved.
苏ICP备16047353号-1