Tunneling oxidation/polysilicon deposition
Zhu Rong Series ZR5000×2 Tubular PECVD ToxPoly All-in-one System
Zhu Rong series ZR5000×2 tubular PECVD ToxPoly All-in-one system utilizes micro-conducting nanometer to take the lead in breaking through the PECVD tunnelling oxide layer and in-situ doped polycrystalline silicon layer coating technology and know-how for pilot and GW level mass production, which has solved the bottlenecks of the equipment for the conductive coating of the tubular PECVD equipment of the PE-TOPCon technology route and the process bottleneck that poly is prone to bursting in the low temperature. The PE-TOPCon technology route solves the equipment bottleneck of conductive film plating in tubular PECVD equipment and the process bottleneck of low-temperature poly film bursting, realizes the deposition of ultra-thin tunneling oxide layer, amorphous silicon layer, in-situ doped polysilicon layer, and in-situ mask layer in the same process tube, greatly simplifies the production process, and is specifically designed for high-efficiency battery technologies such as contact passivation (TOPCon, XBC, and HJT+TOPCon) and provides reliable mass production solutions and new routes to the industrialization of TOPCon battery technology. It provides a reliable mass production solution and a new route for the industrialization of TOPCon cell technology, and helps the cell technology iteration from PERC to TOPCon.
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