CN
Product Technology
semicon
IC
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Advanced Packaging
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
MEMS
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
silicon-based microdisplay
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
semiconductor industry
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
other
Trancendor® Wafer Vacuum Transfer System
photovoltaic
boron diffusion
Hsihe® Series High Temperature Low Pressure Systems
annealing
Hsihe® Series High Temperature Low Pressure Systems
Tunneling oxidation/polysilicon deposition
Zhu Rong Series ZR5000×2 Tubular PECVD ToxPoly All-in-one System
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
Positive film Al₂O₃/SiNₓ
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
positive film Al₂O₃
Quaife® Series KF20000 Batch ALD System
backing film SiNₓ
Zhu Rong Series ZR5000×1 Tubular PECVD System
barrier package
electron transport layer SnOₓ
Interface layer/encapsulation layer AIOₓ
Industrialization Application Center
Industrialization Application Center
iOptomic Series Atomic Layer Deposition Systems
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Houyi® Series Plate ALD System
iSparol Series Roll-to-Roll ALD System
iTomic® MW Lite Bulk Light Series Atomic Layer Deposition System
semiconductor industry
iTomic® Lite Series Lightweight Atomic Layer Deposition System
iTomic® Lite light series atomic layer deposition system adopts original design and development of automation platform combined with modular ALD reaction chamber, dominated by localized parts and components, can be configured on-demand PEALD or Thermal ALD and other process requirements. iTomic® Lite ALD series equipment has a strong compatibility with its hardware configuration in the context of maintaining the powerful functions of the mass-production models, can meet the needs of all types of wafer size (6, 8 inches), and can also meet customers' high-end R & D and new process trial volume production needs. Lite ALD series can be widely used in MEMS, optoelectronic devices and other pan-semiconductor device fields.
Sales Email
Product Features
Flexible compatibility with Thermal ALD and PEALD process applications
1
Freely configurable semi-automatic or fully automatic systems
2
Thin film materials: Al₂O₃, SiO₂, TiO₂, ZnO, nitride, etc
3
Meet the needs of 6, 8-inch wafer mass production process
4
Meet the needs of high-end R&D customers and the development and mass production of new processes
5
Reception Hotline：
0510-81975900
Company Addresses：
江苏省无锡市新吴区长江南路27号
Site Map | Privacy | Legal Notices
© 2013 Jiangsu Microguide Nano Technology Co. All rights reserved.
苏ICP备16047353号-1