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iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Advanced Packaging
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
MEMS
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
silicon-based microdisplay
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
semiconductor industry
iTomic® HiK Series Atomic Layer Deposition Systems
iTronix® Series Chemical Vapor Deposition Systems
iTomic® MW Series Batch Atomic Layer Deposition System
iTomic® Lite Series Lightweight Atomic Layer Deposition System
other
Trancendor® Wafer Vacuum Transfer System
photovoltaic
boron diffusion
Hsihe® Series High Temperature Low Pressure Systems
annealing
Hsihe® Series High Temperature Low Pressure Systems
Tunneling oxidation/polysilicon deposition
Zhu Rong Series ZR5000×2 Tubular PECVD ToxPoly All-in-one System
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
Positive film Al₂O₃/SiNₓ
Zhu Rong Series ZR5000×2 Tubular PEALD/PECVD Integrated System
Zhu Rong Series ZR5000×3 Tubular PEALD/PECVD Integrated System
positive film Al₂O₃
Quaife® Series KF20000 Batch ALD System
backing film SiNₓ
Zhu Rong Series ZR5000×1 Tubular PECVD System
barrier package
electron transport layer SnOₓ
Interface layer/encapsulation layer AIOₓ
Industrialization Application Center
Industrialization Application Center
iOptomic Series Atomic Layer Deposition Systems
iTomic® PE Series Plasma Enhanced Atomic Layer Deposition Systems
Houyi® Series Plate ALD System
iSparol Series Roll-to-Roll ALD System
iTomic® MW Lite Bulk Light Series Atomic Layer Deposition System
positive film Al₂O₃
Quaife® Series KF20000 Batch ALD System
The Quartus series industrial batch type atomic layer deposition system adopts Microguide's original reaction chamber design and advanced thin film deposition and automation integration technology, which can provide high-quality and ultra-thin passivation film preparation for high-efficiency crystalline silicon solar cell surface passivation to ensure further improvement of cell photovoltaic conversion efficiency. Based on the design principle of successful mass production models, the Quartus Series ALD thin film passivation system is the fifth generation of Microguide Nano's original design, which represents the advanced technology of domestic innovative equipment in the photovoltaic industry. It provides ultra-high throughput while minimizing the operating cost of the equipment to provide customers with reliable mass production solutions and lead the photovoltaic industry to manufacture high-efficiency batteries in an intelligent way.
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Product Features
Suitable for high-efficiency cell technologies such as PERC, PERT, TOPCon, XBC, HJT, Perovskite, Tandem-Cell, etc
1
Thin films including Al₂O₃, SiO₂, TiO₂, ZnO, SnO₂, HfO₂, ZrO₂, etc. can be prepared
2
The maximum loading capacity of a single chamber is up to 3360 wafers/batch, compatible with M10-M12 wafer sizes, and easy to upgrade and switch
3
Accurately realizes atomic-level film thickness control (1-10 nm, adjustable) with excellent film thickness uniformity
4
Individually operated reaction chambers ensure maximized plant uptime (>99%)
5
Provides customized complex nano-stacking processes as well as CVD compatibility
6
Reception Hotline：
0510-81975900
Company Addresses：
江苏省无锡市新吴区长江南路27号
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